Nano and Interfacial Catalysis Research Center
Home > Research > Two-dimensional Thermoelectric Materials备份 > PUBLICATIONS > 正文

Role of the carrier gas flow rate in monolayer MoS2 growth by modified chemical vapor deposition
2019-10-21 20:08:01

8215–8220

上一条：Progress of Photodetectors Based on the Photothermoelectric Effect 下一条：Dramatically enhanced thermoelectric performance of MoS2 by introducing MoO2 nanoinclusions

【关闭】

PUBLICATIONS
LINKS:
DICP SKLC NSFC CAS MOST

Phone: +86 411 8468 6637
 Fax: +86 411 8469 4447
 Address: Dalian Institute of Chemical Physics (DICP) Chinese Academy of Sciences (CAS) 457 Zhongshan Road,116023 Dalian P.R. China
 © Copyright Bao's Group. in DICP Webmaster: xcliu@dicp.ac.cn